Tin-doped Indium Oxide的意思|示意

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锡掺杂氧化铟

Tin-doped Indium Oxide的网络常见释义

掺杂锡之铟氧化物成分：掺杂锡之铟氧化物(Tin-doped Indium Oxide) 年代：1934年被美国铟矿公司最早合成出来世界最大ITO薄膜制造国：日本选用率：在TCO材料中，75%应用在平面显示器主要应用：...

Tin-doped Indium Oxide相关短语

1、 tin-doped indium oxide film 掺锡氧化铟薄膜

2、 tin-doped indium oxide films 掺锡氧化铟薄膜

3、 tin doped indium oxide nanometer 纳米氧化铟锡

Tin-doped Indium Oxide相关例句

Zinc oxide thin films were prepared by pulsed laser deposition (PLD) on glass substrates coated with tin-doped indium oxide (ITO) thin films in this paper.

本文采用射频辅助脉冲激光沉积(PLD)系统，在镀有透明导电膜氧化锡铟(ito)的玻璃衬底上制备了氧化锌薄膜。

Tin doped indium oxide (ITO) films were deposited on glass substrates by reactive magnetron sputtering using a metallic alloy target (in Sn, 90 10).