low pressure chemical vapor deposition的意思|示意
低压化学气相沉积
low pressure chemical vapor deposition的网络常见释义
低压化学汽相淀积 ...Low Pin Count 少管脚数量 Low Pressure Chemical Vapor Deposition 低压化学汽相淀积 A chemical vapor deposition process that takes place at moderate temperatures. 一种化学汽相淀积过程,发生在适度的温度下。
低压化学气相沉积 ...涂层;低压化学气相沉积;相组成;显微组织;均匀性[gap=1234]Key words: ZrC coating; low pressure chemical vapor deposition; phase composition; microstructure; homogeneity..
低压化学气 low pressure chemical vapor deposition 低压化学汽相淀积 ; 低压化学气相沉积 ; 低压化学气 ; 低压化学气相沉积系统 high pressure chemical vapor deposition 高压化学气相沉积 .
低压化学气相沉积系统 low pressure chemical vapor deposition 低压化学汽相淀积 ; 低压化学气相沉积 ; 低压化学气 ; 低压化学气相沉积系统 high pressure chemical vapor deposition 高压化学气相沉积 ..
low pressure chemical vapor deposition相关短语
1、 LPCVD Low-Pressure Chemical Vapor Deposition 低压化学气相沉积
low pressure chemical vapor deposition相关例句
Diamond thin films were successfully deposited on single - crystal si substrate at low pressure by a homemade equipment of electron cyclotron resonance chemical vapor deposition (ECRCVD).
采用国内研制的电子回旋共振化学气相沉积(ECRCVD)设备,在单晶硅衬底上沉积了金刚石薄膜。