sputtering ion plating的意思|示意
溅射离子镀
sputtering ion plating的网络常见释义
离子镀 尤其是可依靠提高射频激励增加离化率,优化薄膜沉积过程溅射离子镀 (sputtering ion plating)是在溅射沉积法的基础上，在基片上施加偏压，并可通入反应气体， 形成薄膜的方法。
sputtering ion plating相关短语
1、 magnetron sputtering ion plating 磁控溅射离子镀
2、 magnetron-sputtering ion-plating films 磁控溅射离子镀
3、 reaction magnetron sputtering ion plating 反应磁控溅射离子镀
sputtering ion plating相关例句
The magnetron-sputtering ion plating aluminum film is not simply an out- covering layer of a single substance, but an alloy film containing both aluminum and copper.
磁控溅射离子镀铝膜不是简单的单质外接铝膜，而是铜和铝组成的合金膜。
Its structure and character were reviewed, and the synthetic methods, including CVD, ion beam sputtering, laser ablation, ion plating and ion irradiation et al., were completely introduced.
目前主要采用化学气相沉积法、离子束溅射法、激光等离子体沉积和激光烧蚀、离子镀、离子注入法等制备方法。
ABSTRACT: in this paper a reactive ion plating method and system configuration of Gas ion source enhanced Magnetron Sputtering (GIMS) is presented in details.
摘要：本文详细介绍了气体离子源增强磁控溅射(气离溅射)反应离子镀膜技术和系统配置。
ABSTRACT the application of pulse technique on arc ion plating and magnetron sputtering is summarized in the article.
摘要本文综述了国内外脉冲工艺在电弧离子镀和磁控溅射中的应用。
Arc ion plating or magnetron sputtering provides the best application condition for pulse technique.
电弧或溅射离子镀高的离化率为脉冲工艺提供了最好的应用条件。
The ion plating is a new technique combined vacuum evaporation plating with sputtering.
离子镀是真空蒸镀与溅射相结合的新工艺。