stress in thin film的意思|示意

Two-dimensional finite element modeling was used to simulate the thermal stress in unpassivated and passivated aluminum thin film interconnects.

对有钝化层与无钝化层的铝互连线的热应力进行了数值模拟，并建立起互连线的二维有限元模型。

In order to meet the requirements of optical, electronic and mechanical performance of semiconductor products, it is necessary to measure thin film stress during the deposition.

为使半导体产品达到所要求的光学、电子和机械性能，必须实时地在沉积过程中直接测量薄膜应力。

The measurement of stress change in thin film by Substrate Curvature method is introduced in this paper.

有关薄膜应力的一般测量方法存在精度不高和不能实时测量的缺点。