Reactive magnetron sputtering的意思|示意
反应磁控溅射
Reactive magnetron sputtering的网络常见释义
溅射法 ...Kivaisi等人n劬以纯金属钒（纯度99．7％）为原料，采用直流（Dc）和射频（RF）反应磁控溅射法（Reactive magnetron sputtering）在普通玻璃衬底上制备V02薄膜。
反应磁控溅射 1．4．1反应磁控溅射（Reactive Magnetron Sputtering） 反应磁控溅射法利用辉光放电的原理进行工作，溅射过程中要用到时气和02气，舡作为溅射气体，02作为反应气体，通过流量控制器分别...
Reactive magnetron sputtering相关短语
1、 DC reactive magnetron sputtering 直流反应磁控溅射 ; 直流磁控溅射
2、 RF-reactive magnetron sputtering 反应磁控溅射
3、 Direct current reactive magnetron sputtering 磁控溅射法
Reactive magnetron sputtering相关例句
TiOx thin films at the conditions of different depositing temperatures were on prepared on glass substrates by DC reactive magnetron sputtering.
通过磁控反应溅射，在玻璃基底上制备了不同溅射温度下的氧化钛薄膜。
HfOxNy thin films were deposited by radio frequency reactive magnetron sputtering onto multi-spectral ZnS substrates at different oxygen partial pressure.
用磁控反应溅射法在不同氧分压下制备了氮氧化铪薄膜。
ZnO: Al thin films were prepared on slide glass substrates by non-reactive DC magnetron sputtering at room temperature.
采用直流磁控溅射工艺，室温下在载玻片上制备了氧化锌铝透明导电薄膜。
Reactive magnetron sputtering was used to prepare many kinds of compound films extensively.
反应磁控溅射被广泛应用于制备化合物薄膜。
Tin doped indium oxide (ITO) films were deposited on glass substrates by reactive magnetron sputtering using a metallic alloy target (in Sn, 90 10).
采用铟锡合金靶(铟锡，90 - 10)，通过直流反应磁控溅射在玻璃基片上制备出ito薄膜，并在大气环境下高温退火处理。
Niobium oxide optical thin films have been prepared by low frequency reactive magnetron sputtering system.
利用低频反应磁控溅射制备五氧化二铌光学薄膜。