magnetron sputtering method的意思|示意

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磁控溅射法

magnetron sputtering method的网络常见释义

磁控溅射法 ...；磁控溅射法；sol-gel 法；铁电性能 [gap=1261]Key words: glass based LSCO/PZT/LSCO capacitor; magnetron sputtering method; sol-gel method; ferroelectric property ..

magnetron sputtering method相关短语

1、 radio frequency magnetron sputtering method 射频磁控溅射法

2、 RF magnetron sputtering method 射频磁控溅射

3、 dc magnetron sputtering method 直流磁控溅射法

magnetron sputtering method相关例句

Silicon oxide ion barrier film was successfully fabricated on the input-face of microchannel plate by magnetron sputtering method.

本文利用射频磁控溅射方法，在微通道板输入面上成功地制备出二氧化硅防离子反馈膜。

ABSTRACT: in this paper a reactive ion plating method and system configuration of Gas ion source enhanced Magnetron Sputtering (GIMS) is presented in details.

摘要：本文详细介绍了气体离子源增强磁控溅射(气离溅射)反应离子镀膜技术和系统配置。

Magnetron sputtering is common method for preparating metal film resistor. by this method, the target is very important for the performance of the resistor.

在金属膜电阻器的生产过程中，靶材是非常关键的，它制约著金属膜电阻器的精度、可靠性、电阻温度系数等性能。

High resistance AZO films are fabricated on quartz substrates by radiofrequency (RF) magnetron sputtering deposition method in the environment with high oxygen proportion.

在石英衬底上采用射频磁控溅射的方法制备高电阻azo薄膜，其中高电阻由高氧氩比环境得到。

TiO2 thin films were deposited on glass and quartz substrates, respectively, using the direct current reactive magnetron sputtering method.

采用直流磁控反应溅射法，在玻璃和石英基体上制备了TiO2薄膜。

Raman spectrometer and atom force microscope were employed to study and determine the structure and characteristics of the films prepared by the method of magnetron sputtering with graphite target.